- All sections
- C - Chemistry; metallurgy
- C07D - Heterocyclic compounds
- C07D 215/06 - Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms having only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached to the ring nitrogen atom
Patent holdings for IPC class C07D 215/06
Total number of patents in this class: 276
10-year publication summary
28
|
27
|
21
|
23
|
23
|
21
|
18
|
16
|
21
|
8
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Canon Inc. | 36841 |
7 |
Sumitomo Chemical Company, Limited | 8808 |
6 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
6 |
LG Chem, Ltd. | 17205 |
4 |
The Regents of the University of California | 18943 |
4 |
Boehringer Ingelheim International GmbH | 4629 |
4 |
Henkel AG & Co. KGaA | 10129 |
4 |
Universal Display Corporation | 1678 |
4 |
High Force Research Limited | 4 |
4 |
Bausch + Lomb Ireland Limited | 601 |
4 |
Bristol-myers Squibb Company | 5080 |
3 |
Samsung Display Co., Ltd. | 30585 |
3 |
JSR Corporation | 2476 |
3 |
Asahi Kasei Pharma Corporation | 144 |
3 |
CHDI Foundation, Inc. | 104 |
3 |
Flexus Biosciences, Inc. | 13 |
3 |
Gilead Sciences, Inc. | 1879 |
3 |
Osaka University | 3143 |
3 |
Raqualia Pharma Inc. | 119 |
3 |
The Research Foundation for The State University of New York | 1468 |
3 |
Other owners | 199 |